With the DREVA400, you get a flexible PVD coating system for the deposition of hard material layers through cathodic arc evaporation.
It also enables you to utilize planar or rotatable magnetron sputter sources extending up to HiPIMS. The evaporators are designed as circular, planar (controlled) ARC evaporation sources.
The hollow cathode plasma source can be used for activation, fine cleaning and heating of the substrates. This is characterised by high discharge currents in the range of >100 A and a correspondingly high plasma density and BIAS currents on the substrates.
The system features fully automatic recipe control, but can also be operated in manual mode. It comes with a number of standard recipes for the deposition of hard coatings.
Would you like to learn more? Explore the content below or contact us.
through cathodic ARC evaporation technology
through modular source configuration
with threefold substrate rotation for 3D parts
San Francisco, CA, USA
The Moscone Center
Booth 2261
Shanghai, China
Shanghai New International Expo Center
N1 / 181
Shanghai, China
National Exhibition and Convention Center
A006
San Francisco, CA, USA
Moscone Center
North Hall | Booth 5373