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VA PROCOS 2
Process Control System for Reactive Sputtering
VA PROCOS 2 is a modular process control system specifically designed for stabilizing reactive sputtering processes in critical transition mode.
It is suitable for process characterization by optical emission lines, cathode voltage, oxygen partial pressure, combinations thereof as well as further PLC signals.
In addition, it can be used to stabilize the plasma discharge and thus the product properties. This is achieved by adjusting the supply of one or more reactive gases.
VON ARDENNE has been a leader in reactive sputtering processes since 1980. In addition, we have been offering our process control system VA PROCOS for many years and have optimized it continuously.
Our current system VA PROCOS 2 controls the reactive magnetron sputtering of composite layers (such as ITO, TiO2, TiN, Al2, O3, AlN, SnO2, SiO2, Si3N4, ZnO, ZrO or Ta2O5 ) and provides reliable stability of the operating points at the critical transition areas. The system also reliably controls one or more inlets for reactive gases (e.g. oxynitrides).
Would you like to learn more? Then take a look at the brochure, or contact us directly.
Reliable & ndustry-proven control
for reactive sputtering of all common layer systems
Easily configurable with external components
for all reactive sputtering applications
Continuous quality assurance
and parameter control
